Semi-Automatic Probe Station for 4-Inch Wafers
MSAPS-100
Semi-Automatic Probe Station for 4-Inch Wafers MSAPS-100
 
This semi-automatic probe station is designed for automatic sequential measurement of many devices formed on 4-inch wafers.
While observing through a microscope, the operator uses manipulators (positioners) to align the probes (needles) precisely with the electrodes of each device. During measurement, the motorized Z-axis stage raises the wafer to bring the electrodes into contact with the probes, and the electrical characteristics are measured.
After each measurement, the wafer is lowered to release contact with the probes, and the motorized XY stage moves it to the next measurement position. The motorized Z-axis stage then raises the wafer again for the next measurement. By automatically repeating this sequence, many devices across the entire wafer can be measured efficiently in succession.
For research and development, characterization, and quality evaluation of semiconductor devices on 4-inch wafers, this system automates measurement and reduces labor, while contributing to shorter measurement times and high measurement repeatability.

■Specifications
Wafer Size Up to 101.6 mm diameter
X/Y Axes Travel: 100 mm
Resolution: 2 μm
Z Axis Travel: 20 mm
Resolution: 0.1 μm
θ Axis Travel: 360°
Minimum scale reading: 1°
Stereo Microscope Optical magnification: 1×–6×
LED illumination included
CCD Camera 1.5 megapixels
Manipulators Stroke (X, Y, Z): 10 mm
Travel per rotation: 250 μm
Vacuum Pump (for Wafer Chucking) Ultimate vacuum: -33.3 kPa

*Specifications and appearance are subject to change without notice for product improvement.